Recent Development in Photosensitive Polyimide (PSPI)
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- Mochizuki Amane
- Core Technology Center, Nitto Denko Co. Ltd.
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- Ueda Mitsuru
- Department of Organic and Polymeric Materials, Tokyo Institute of Technology
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Description
Photosensitive polyimides (PSPIs) are attracting much attention as an insulating materials for microelectronic applications. PSPIs can be directly patterned, simplify processing steps and do not need a photoresist to be used in the micro-lithographic stage, nor a toxic etchant. This review introduces the recent development of PSPIs with emphasis placed on the chemistry responsible for images.
Journal
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- Journal of Photopolymer Science and Technology
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Journal of Photopolymer Science and Technology 14 (5), 677-687, 2001
The Society of Photopolymer Science and Technology(SPST)
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Details 詳細情報について
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- CRID
- 1390282679300516864
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- NII Article ID
- 130003488439
- 40005352093
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- NII Book ID
- AA11576862
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- COI
- 1:CAS:528:DC%2BD38XitVCjtr8%3D
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- ISSN
- 13496336
- 09149244
- http://id.crossref.org/issn/09149244
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- NDL BIB ID
- 6042721
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- Text Lang
- en
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed