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- Goto Hiroshi
- Micro-Pattern Imprinting Machine Division, TOSHIBA MACHINE CO.,LTD.
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- Hagiwara Akihiko
- Micro-Pattern Imprinting Machine Division, TOSHIBA MACHINE CO.,LTD.
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- Ishibashi Kentaro
- Micro-Pattern Imprinting Machine Division, TOSHIBA MACHINE CO.,LTD.
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- Kokubo Mitsunori
- Micro-Pattern Imprinting Machine Division, TOSHIBA MACHINE CO.,LTD.
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- Okuyama Hiroshi
- Micro-Pattern Imprinting Machine Division, TOSHIBA MACHINE CO.,LTD.
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- Fukuyama Satoshi
- Micro-Pattern Imprinting Machine Division, TOSHIBA MACHINE CO.,LTD.
この論文をさがす
抄録
Nanoimprint process is a simple and a low cost micro/nano fabrication method based on mold replication principle. UV nanoimprint has capable of high accuracy and precise patterning because of lower press force and lower heat generation process comparing with thermal nanoimprint. Therefore, various kinds of devices required high accuracy patterning such as optical devices, patterned medias,electronics and MEMS devices are greatly expected as UV nanoimprint applications. In this paper, our recent progress including tools and replication results on UV nanoimprint is described.
収録刊行物
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- Journal of Photopolymer Science and Technology
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Journal of Photopolymer Science and Technology 20 (4), 559-562, 2007
フォトポリマー学会
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詳細情報 詳細情報について
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- CRID
- 1390282679300535424
-
- NII論文ID
- 130004464585
- 40015602529
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- NII書誌ID
- AA11576862
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- COI
- 1:CAS:528:DC%2BD2sXot1WmsLY%3D
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- ISSN
- 13496336
- 09149244
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- NDL書誌ID
- 8919357
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可