Oxime Sulfonate Chemistry for Advanced Microlithography

DOI Web Site Web Site 被引用文献2件 参考文献12件
  • Yamamoto Hitoshi
    Technology Center Electronic Materials, Coating Effects Segment, Ciba Specialty Chemicals K.K.
  • Asakura Toshikage
    Technology Center Electronic Materials, Coating Effects Segment, Ciba Specialty Chemicals K.K.
  • Nishimae Yuichi
    Technology Center Electronic Materials, Coating Effects Segment, Ciba Specialty Chemicals K.K.
  • Matsumoto Akira
    Technology Center Electronic Materials, Coating Effects Segment, Ciba Specialty Chemicals K.K.
  • Tanabe Junichi
    Technology Center Electronic Materials, Coating Effects Segment, Ciba Specialty Chemicals K.K.
  • Birbaum Jean-Luc
    Technology Center Electronic Materials, Coating Effects Segment, Ciba Specialty Chemicals K.K.
  • Murer Peter
    Technology Center Electronic Materials, Coating Effects Segment, Ciba Specialty Chemicals K.K.
  • Hinterman Tobias
    Technology Center Electronic Materials, Coating Effects Segment, Ciba Specialty Chemicals K.K.
  • Ohwa Masaki
    Technology Center Electronic Materials, Coating Effects Segment, Ciba Specialty Chemicals K.K.

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Oxime sulfonate compounds are one of the important chemistry as photoacid generator for advanced lithography application and practically used in mass production of semiconductor chips. This chemistry is adjustable for various applications like g-/h-/i-line, KrF and ArF lithography. This paper describes an overview of oxime sulfonate chemistry for semiconductor resist application, including commercially available products.

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