Preparation and Photoreactivity of a Novel Lophine Dimer Containing a Hydrophilic Group

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  • Igarashi Hiroyuki
    Department of Pure and Applied Chemistry, Faculty of Science and Technology, Tokyo University of Science
  • Igarashi Tsutomu
    Electronics Interconnecting Materials Technology & Development Department, Asahi Kasei EMD Corporation
  • Sagawa Minoru
    Electronics Interconnecting Materials Technology & Development Department, Asahi Kasei EMD Corporation
  • Mori Toru
    Electronics Interconnecting Materials Technology & Development Department, Asahi Kasei EMD Corporation
  • Kotani Yuzo
    Electronics Interconnecting Materials Technology & Development Department, Asahi Kasei EMD Corporation
  • Muroya Yusa
    Nuclear Engineering Research Laboratory, School of Engineering, The University of Tokyo
  • Katsumura Yosuke
    Nuclear Engineering Research Laboratory, School of Engineering, The University of Tokyo
  • Yamashita Takashi
    Department of Pure and Applied Chemistry, Faculty of Science and Technology, Tokyo University of Science

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Novel lophine dimer (hexaarylbiimidazole, HABI) containing a hydrophilic oligo-ethylene glycol group was prepared as a radical initiator. Absorption of a lophyl radical generated by photo dissociation of the lophine dimer was observed around 600nm by photo irradiation at 254nm. Electron beam (EB) pulse radiolysis of the lophine dimer suggested generation of lophyl radical by EB irradiation similarly, showing that the material is also applicable to electron beam lithography. The lophine dimmer showed excellent stability in developing solution and high resolution due to introduction of hydrophilic substituent.

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