Photocatalytic Lithography Based on Photocatalytic Remote Oxidation
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- Tatsuma Tetsu
- Institute of Industrial Science, University of Tokyo
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- Kubo Wakana
- Institute of Industrial Science, University of Tokyo
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Abstract
Photocatalytic lithography is a method for surface patterning based on photocatalytic remote oxidation. A TiO2-coated photomask is faced with a surface to be patterned, and irradiated with UV light. If a glass plate modified with alkyl chains is used, hydrophilic/hydrophobic patterns can be obtained. The alkyl chains in the irradiated regions are removed by oxidative decomposition, and those in the non-irradiated regions are left. Irradiation time is 30-60 s, and resolution is about 5 μm. This technique is potentially applicable to fabrication of biochips, lab-on-a-chip devices and simple electronic circuits.
Journal
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- Journal of Photopolymer Science and Technology
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Journal of Photopolymer Science and Technology 20 (1), 83-86, 2007
The Society of Photopolymer Science and Technology(SPST)
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Details 詳細情報について
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- CRID
- 1390282679300848896
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- NII Article ID
- 130004833167
- 40015602454
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- NII Book ID
- AA11576862
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- COI
- 1:CAS:528:DC%2BD2sXot1Wntr4%3D
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- ISSN
- 13496336
- 09149244
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- NDL BIB ID
- 8918311
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- Text Lang
- en
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed