Influence of Sensitizer on Two-photon Initiated Polymerization (TPIP) in Photoresist SU-8
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- Kondo Naoko
- Division of Applied Chemistry, Graduate School of Engineering, Tokyo University of Agriculture and Technology
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- Watanabe Toshiyuki
- Division of Applied Chemistry, Graduate School of Engineering, Tokyo University of Agriculture and Technology
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- Totani Kenro
- Division of Applied Chemistry, Graduate School of Engineering, Tokyo University of Agriculture and Technology
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Abstract
Influence of photosensitizer on two-photon initiated polymerization (TPIP) of epoxide resin have been investigated. The three-dimensional (3D) micro-structures were fabricated to estimate rate of cationic polymerization by using TPIP. The line width and thickness of 3D micro-structures were measured as a function of laser-pulse energy, irradiation wavelength, and scanning speed to elucidate the rate of polymerization (Rp). It was demonstrated that volume of 3D micro-structures depends on the square of input intensity and proportional to two-photon absorption cross section and irradiation time of laser. Rp strongly depends on the quantum yield of H+ rather than efficiency of electron transfer from photosensitizer to initiator. Experimental results were compared with an original mathematical model.
Journal
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- Journal of Photopolymer Science and Technology
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Journal of Photopolymer Science and Technology 20 (2), 291-297, 2007
The Society of Photopolymer Science and Technology(SPST)
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Keywords
Details 詳細情報について
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- CRID
- 1390282679300959232
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- NII Article ID
- 130004464545
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- NII Book ID
- AA11576862
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- COI
- 1:CAS:528:DC%2BD2sXot1WnurY%3D
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- ISSN
- 13496336
- 09149244
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- NDL BIB ID
- 8918951
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- Text Lang
- en
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed