The Photopolymer Science and Technology Award

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  • Photopolymer Science and Technology Award

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Abstract

The Photopolymer Science and Technology Award No.052100, the Best Paper Award 2005, was presented to Akira Kawai, Takayoshi Niiyama, Masahito Hirano, Makoto Sakata and Atsushi Ishikawa, all from Nagaoka University of Technology, for their outstanding contribution published in Journal of Photopolymer Science and Technology 17(3), 441-448 (2004), entitled "Cohesion Property of Resist Pattern Surface Analyzed by Tip Indentation Method", ibid., 17(3), 453-456 (2004), entitled "Interaction Force Analysis of Resist Film Surface in Water Vapor", ibid., 17(3), 457-460 (2004), entitled "Meniscus Analysis in Micro Gap During Liquid Drying Process", and ibid., 17(3), 461-464 (2004), entitled "Analysis for Drying Behavior of Rinse Water Depended on Resist Pattern Arrangement".

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