Fundamental Studies of Acid-Breakable Resins for Chemical-Amplification Positive Resist Matrices.
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- Arai Tadashi
- Central Research Laboratory, Hitachi, Ltd.
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- Migitaka Sonoko
- Central Research Laboratory, Hitachi, Ltd.
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- Sakamizu Toshio
- Central Research Laboratory, Hitachi, Ltd.
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- Kasuya Kei
- Yamazaki Works, Hitachi Chemical Co., Ltd.
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- Hashimoto Michiaki
- Yamazaki Works, Hitachi Chemical Co., Ltd.
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- Shiraishi Hiroshi
- Central Research Laboratory, Hitachi, Ltd.
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Abstract
We have investigated acid-breakable (AB) resins for chemical-amplification positive resists. The AB resin was synthesized by a co-condensation reaction between an alkali-soluble polyphenol (4, 4′-[1-[4-[1-(4-Hydroxyphenyl)-1-methylethyl]phenyl]-ethylidene]bis phenol) and an aromatic multi-functional (tri-functional) vinylether compound. The AB resin did not dissolve in an aqueous base developer (TMAH: 2.38%), and it had a good margin for the polyphenol/vinylether feed ratio. Even for AB resins, with large differences in molecular weight, the AB-resin-based resist exhibited almost the same exposure characteristics. We also examined the relationship between the inhomogeneous distribution of the acid generator and the film structure of the AB-resin-based resist.
Journal
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- Journal of Photopolymer Science and Technology
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Journal of Photopolymer Science and Technology 14 (4), 523-530, 2001
The Society of Photopolymer Science and Technology(SPST)
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Details 詳細情報について
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- CRID
- 1390282679301438976
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- NII Article ID
- 130003406676
- 40005352075
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- NII Book ID
- AA11576862
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- COI
- 1:CAS:528:DC%2BD3MXmt1Wntrw%3D
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- ISSN
- 13496336
- 09149244
- http://id.crossref.org/issn/09149244
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- NDL BIB ID
- 5833464
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- Text Lang
- en
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed