Localized Abrasion Resistance Test for Antisticking Layer by Atomic Force Microscopy
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- Okada Makoto
- LASTI, University of Hyogo
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- Haruyama Yuichi
- LASTI, University of Hyogo
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- Matsui Shinji
- LASTI, University of Hyogo
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Abstract
We demonstrated the localized abrasion resistance test by AFM to examine the ASL deterioration induced by local friction. It was found that the contamination may attach to the ASL formed using FAS-13 due to leaving in air, because the adhesion and frictional forces increased when we measured about 2 days after from ASL forming. Although the localized abrasion resistance test was carried out for about 1 week, the contamination due to experimental conditions were not avoided, which might be caused the random behaviors of adhesion and frictional forces. However, we proved from these results that the localized abrasion resistance test by AFM was one of the useful evaluation methods to examine the ASL deterioration induced by local friction. We will further study ALS deterioration deeply by AFM with an optimized experimental condition.
Journal
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- Journal of Photopolymer Science and Technology
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Journal of Photopolymer Science and Technology 27 (1), 103-106, 2014
The Society of Photopolymer Science and Technology(SPST)
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Details 詳細情報について
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- CRID
- 1390282679301510272
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- NII Article ID
- 130004678308
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- NII Book ID
- AA11576862
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- ISSN
- 13496336
- 09149244
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- NDL BIB ID
- 025604437
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- Text Lang
- en
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed