Process Evaluation of Directed Self-assembly Lithography using Simulation Method based on Self-consistent Field Theory
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- Kodera Katsuyoshi
- DSA Research Dept., EUVL Infrastructure Development Center, Inc.
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- Kanai Hideki
- DSA Research Dept., EUVL Infrastructure Development Center, Inc.
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- Sato Hironobu
- DSA Research Dept., EUVL Infrastructure Development Center, Inc.
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- Kihara Naoko
- DSA Research Dept., EUVL Infrastructure Development Center, Inc.
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- Kasahara Yusuke
- DSA Research Dept., EUVL Infrastructure Development Center, Inc.
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- Kobayashi Katsutoshi
- DSA Research Dept., EUVL Infrastructure Development Center, Inc.
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- Miyagi Ken
- DSA Research Dept., EUVL Infrastructure Development Center, Inc.
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- Minegishi Shinya
- DSA Research Dept., EUVL Infrastructure Development Center, Inc.
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- Tobana Toshikatsu
- DSA Research Dept., EUVL Infrastructure Development Center, Inc.
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- Fujiwara Tomoharu
- DSA Research Dept., EUVL Infrastructure Development Center, Inc.
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- Hirayanagi Noriyuki
- DSA Research Dept., EUVL Infrastructure Development Center, Inc.
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- Kawamonzen Yoshiaki
- DSA Research Dept., EUVL Infrastructure Development Center, Inc.
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- Azuma Tsukasa
- DSA Research Dept., EUVL Infrastructure Development Center, Inc.
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抄録
We have investigated the process margin for fabrication of line/space directed self-assembled (DSA) patterns using a simulation method based on self-consistent field theory. We studied three systems, namely, chemoepitaxial DSA using lamellar-forming block copolymers (BCPs), graphoepitaxial DSA using lamellar-forming BCPs, and graphoepitaxial DSA using cylindrical BCPs. In the case of the chemoepitaxial DSA, both the subtle change of the wetting condition and the topography of the prepattern surface were found to strongly affect the process margin of the pinning layer width. In the case of the graphoepitaxial DSA using cylindrical BCPs, both the pattern pitch and CD of the forming DSA cylindrical patterns were found to intensely depend on both the trench width and the film thickness of the BCPs.
収録刊行物
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- Journal of Photopolymer Science and Technology
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Journal of Photopolymer Science and Technology 27 (1), 31-36, 2014
フォトポリマー学会
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詳細情報 詳細情報について
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- CRID
- 1390282679301541376
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- NII論文ID
- 130004678315
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- NII書誌ID
- AA11576862
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- ISSN
- 13496336
- 09149244
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- NDL書誌ID
- 025604274
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可