Release Property of HSQ Replica Mold Fabricated by Room Temperature Nanoimprinting with PDMS soft mold

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We examined the release property of HSQ pattern fabricated by RT nanoimprinting using PDMS soft mold. The water contact angle of HSQ was increased by RT-nanoimprinting with baking process. It was found that the improvement of release property was caused by PDMS adhesion onto HSQ. In addition, PDMS adhesion onto HSQ was also occurred in thermal and UV nanoimprintings using PDMS soft mold. As a result, it was confirmed that the HSQ pattern fabricated by RT-nanoimprinting with baking process can be used as the replica mold without ASL coating process. We have been further studying about durability of the replica HSQ mold fabricated by RT-nanoimprinting with baking process.

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