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- Kato Nobuhiro
- Department of Biomedical Engineering, Faculty of Biology Oriented Science and Technology, Kinki University
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- Kai Takahisa
- Department of Biomedical Engineering, Faculty of Biology Oriented Science and Technology, Kinki University
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- Hirano Masakazu
- Kyokko-Seiko Corp.
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抄録
Backside lithography with a moving mask UV exposure technique is proposed. A novel moving-mask exposure apparatus was developed and evaluated both experimentally and through exposure simulations. The backside exposure using this technique was validated and is capable of producing tapered microstructures of thick photoresist for molding. The shape of the structure can be modified by the trajectory of the stage movement. It was confirmed that the shape of the processed structure could be successfully predicted using the proposed simulation method.
収録刊行物
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- Journal of Photopolymer Science and Technology
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Journal of Photopolymer Science and Technology 27 (1), 85-89, 2014
フォトポリマー学会
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詳細情報 詳細情報について
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- CRID
- 1390282679301549696
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- NII論文ID
- 130004678324
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- NII書誌ID
- AA11576862
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- ISSN
- 13496336
- 09149244
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- NDL書誌ID
- 025604398
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可