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- Mori Kazunori
- Department of Chemistry, The University of Texas Central Glass Company Ltd.
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- Blachut Gregory
- McKetta Department of Chemical Engineering, The University of Texas
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- Bates Christopher M.
- Department of Chemistry, The University of Texas
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- Maher Michael J.
- Department of Chemistry, The University of Texas
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- Strahan Jeffery R.
- Department of Chemistry, The University of Texas
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- Sirard Stephen M.
- Lam Research Corp.
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- Durand William J.
- McKetta Department of Chemical Engineering, The University of Texas
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- Ellison Christopher J.
- McKetta Department of Chemical Engineering, The University of Texas
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- Willson C. Grant
- Department of Chemistry, The University of Texas McKetta Department of Chemical Engineering, The University of Texas
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The controlled synthesis of poly(styrene-block-trimethylstannylstyrene) has been accomplished. Thin films of the polymer were successfully oriented perpendicular to the substrate through use of neutral top and bottom coats to produce well-formed lamellae with the classical finger print pattern. Preliminary blanket etch studies show that the inclusion of tin into the block copolymer provides very high etch contrast for selective removal of the styrene block in both oxygen and fluorine plasma conditions. The etch rate of the tin polymer is significantly slower than that of thermal oxide under the conditions studied. Future work will be directed toward the synthesis of a sample with smaller pitch and to a study of the potential for use of organotin polymers for the patterning of fused silica imprint templates.
収録刊行物
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- Journal of Photopolymer Science and Technology
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Journal of Photopolymer Science and Technology 27 (4), 445-448, 2014
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詳細情報 詳細情報について
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- CRID
- 1390282679301762176
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- NII論文ID
- 130004687608
- 40020133020
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- NII書誌ID
- AA11576862
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- ISSN
- 13496336
- 09149244
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- NDL書誌ID
- 025604134
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可