Double-Decker Silsesquioxane-containing Oligomers for Sub-10 nm Scale Fabricating Materials

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  • Wang Lei
    Department of Organic and Polymeric Materials, Graduate School of Science and Engineering, Tokyo Institute of Technology
  • Hayakawa Teruaki
    Department of Organic and Polymeric Materials, Graduate School of Science and Engineering, Tokyo Institute of Technology
  • Yoshida Kazuhiro
    Research Laboratory IV, Ichihara Research Center, JNC Petrochemical Corporation

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Two series of DDSQ (double-decker silsesquioxane)-containing oligomers were synthesized and their self-aggregation behaviors were investigated. Result shows that DDSQ-(C18-2A) could form well-organized lamellar structure with a d-spacing 8.2 nm. Considering the demand of microelectronic industry, this branched alkylated DDSQ may serve as an excellent candidate for the next generation fabricating materials.

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