Innovative and Tailor-made Resist and Working Stamp Materials for Advancing NIL-based Production Technology
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- Schleunitz Arne
- Micro Resist Technology GmbH
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- Vogler Marko
- Micro Resist Technology GmbH
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- Fernandez-Cuesta Irene
- The Molecular Foundry, Lawrence Berkeley National Laboratory
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- Schift Helmut
- Paul Scherrer Institute
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- Gruetzner Gabi
- Micro Resist Technology GmbH
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As a new manufacturing technique based on replication of surface topographies, nanoimprint lithography makes specific demands on materials used as resists for pattern transfer, as molds during replication or as functional materials for permanent application. Thus, highly specialized polymer solutions play a key role for the innovations in nanoimprint-related production technology where a high-throughput and low-cost nanolithography step is performed. In this contribution, recent material innovations at micro resist technology GmbH are reviewed with focus on OrmoStamp(R)as versatile working stamp material with superior mold properties and its unique applicability to various nanoimprint processes. It is shown by the example of multidimensional nanofluidic devices how tailor-made materials facilitate mass production of innovative applications using nanoimprint lithography.
収録刊行物
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- Journal of Photopolymer Science and Technology
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Journal of Photopolymer Science and Technology 26 (1), 119-124, 2013
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詳細情報 詳細情報について
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- CRID
- 1390282679302137344
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- NII論文ID
- 130004465002
- 40019685703
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- NII書誌ID
- AA11576862
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- COI
- 1:CAS:528:DC%2BC3sXhtFalu7%2FJ
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- ISSN
- 13496336
- 09149244
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- NDL書誌ID
- 024660528
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可