Novel Fluorinated Compounds for Releasing Material in Nanoimprint Lithography

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In recent years, the size of patterns used in nanoimprint lithography (NIL) continues to shrink rapidly. Since nanoimprinting is a form of contact printing, increasing the separation force might damage the master and imprinting tool, as well as degrading the pattern quality. The mold-release characteristics of the master and resin remain a key concern. Although Optool DSXTM (DAIKIN Ind. Ltd.) is the de facto standard for mold release agents, its durability with regard to UV-NIL is suspect. Our solution is a class of material that offers enhanced mold-release characteristics. The new fluorinated copolymers based on α-chloroacrylate and low molecular weight perfluorocompounds, are intended to be resist additives. This paper reports the synthesis method of low molecular weight perfluorocompounds, specific properties such as changed surface tension after added to resist, release force and the use of other fluorinated compounds for resin surface treatment.

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