Pattern Scaling of Holes, Bars, and Trenches with Directed Self-Assembly using Polymer Blend
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- Matsui Yoshinori
- IBM Corporation Renesas Electronics Corporation
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- Lin Chi-Chun
- IBM Corporation
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- Abdallah Jassem A.
- IBM Corporation
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- Tseng Chiahsun
- IBM Corporation
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- Xu Yongan
- IBM Corporation
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- Colburn Matthew
- IBM Corporation
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The directed self-assembly (DSA) of polymer blends in various types of guiding patterns was investigated. The change in CD and aspect ratio before and after the DSA process as a function of the pitch and aspect ratio of the guiding patterns are reported. The behavior of polymer blend DSA was found to depend on guiding pattern design rather than a simple conformal, spacer-like shrinking. The results achieved from this study provided useful information for guiding pattern design for this specific polymer blend system.
収録刊行物
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- Journal of Photopolymer Science and Technology
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Journal of Photopolymer Science and Technology 26 (1), 59-63, 2013
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詳細情報 詳細情報について
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- CRID
- 1390282679302162688
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- NII論文ID
- 130004464991
- 40019685475
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- NII書誌ID
- AA11576862
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- COI
- 1:CAS:528:DC%2BC3sXhtFalurbK
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- ISSN
- 13496336
- 09149244
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- NDL書誌ID
- 024660218
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可