The Hole Shrink Problem: Directed Self-Assembly Using Self-Consistent Field Theory
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- Iwama Tatsuhiro
- Asahi Kasei E-Materials Co., Materials Research Laboratory, University of California
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- Laachi Nabil
- Materials Research Laboratory, University of California
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- Delaney Kris T.
- Materials Research Laboratory, University of California
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- Kim Bongkeun
- Materials Research Laboratory, University of California
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- Hur Sun-MI
- Materials Research Laboratory, University of California
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- Bristol Robert
- Intel Corporation
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- Shykind David
- Intel Corporation
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- Weinheimer Curey J.
- Intel Corporation
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- Fredrickson Glenn H.
- Materials Research Laboratory, University of California
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抄録
We use self-consistent field theory (SCFT) to study the self-assembly of diblock copolymers confined in cylindrical and non-cylindrical prepatterns. This situation arises in contact holes -the hole shrink problem- where the goal is to produce a contact hole with reduced dimensions relative to a guiding prepattern. In this study, we focus on systems with a critical dimensions (CD) ranging from ~50nm to ~100nm leading to the formation of a single PMMA domain in the middle of the holes. We found that different morphologies arise from the self-assembly process and are strongly governed by the prepattern dimensions, wetting conditions, shape of prepatten as well as the polymer molecular weight. We also considered blends of diblock copolymers and homopolymers and determined optimal blending configurations that not only favor the formation of the desired cylindrical morphology but also extend the processing window relative to the pure diblock case in cylindrical confinements.
収録刊行物
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- Journal of Photopolymer Science and Technology
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Journal of Photopolymer Science and Technology 26 (1), 15-20, 2013
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詳細情報 詳細情報について
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- CRID
- 1390282679302174592
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- NII論文ID
- 130004464983
- 40019685380
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- NII書誌ID
- AA11576862
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- COI
- 1:CAS:528:DC%2BC3sXhtFalurnM
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- ISSN
- 13496336
- 09149244
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- NDL書誌ID
- 024660087
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可