Alkaline-developable Positive-type Photosensitive Polyimide based on Fluorinated Poly(amic acid) and Fluorinated Diazonaphthoquinone

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  • Inoue Yusuke
    Department of Organic and Polymeric Materials, Graduate School of Science and Engineering, Tokyo Institute of Technology
  • Higashihara Tomoya
    Department of Organic and Polymeric Materials, Graduate School of Science and Engineering, Tokyo Institute of Technology
  • Ueda Mitsuru
    Department of Organic and Polymeric Materials, Graduate School of Science and Engineering, Tokyo Institute of Technology

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An alkaline-developable positive-type photosensitive polyimide (PSPI) based on fluorinated poly(amic acid) (FPAA) prepared from 4,4’-hexafluoroisopropyridenebis(phthalic anhydride) and 4,4’-oxydianiline, and fluorinated diazonaphthoquinone (FDNQ) as a dissolution inhibitor has been successfully developed. The solution of FPAA and FDNQ was spin-coated on a silicon wafer and prebaked, inducing a FDNQ rich surface which was supported by measurement of the contact angle of water on the films. The PSPI containing FPAA and FDNQ (25 wt% to FPAA) showed the high sensitivity of 45 mJ/cm2 and excellent contrast (γ0) of 10 when it was exposed to 365 nm wavelength light (i-line) and developed with a 2.38 wt% tetramethylammonium hydroxide aqueous solution at 25 °C. A clear positive pattern of a 6-μm line and space was obtained on a film when exposed to 120 mJ/cm2 of i-line by a contact printing method.

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