Study of Swelling Behavior in ArF Resist during Development by the QCM Method (3) - Observations of Swelling Layer Elastic Modulus -
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- Sekiguchi Atsushi
- Litho Tech Japan Corporation
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The QCM method allows measurements of impedance, an index of swelling layer viscosity in a photoresist during development. While impedance is sometimes used as a qualitative index of change in the viscosity of the swelling layer, it has not so far been used quantitatively, for data analysis. We explored a method for converting impedance values to elastic modulus (Pa) and a coefficient expressing viscosity. Applying this method, we compared changes in the viscosity of the swelling layer in an ArF resist generated during development in a TMAH developing solution and in a TBAH developing solution. This paper reports the results of this comparative study.
収録刊行物
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- Journal of Photopolymer Science and Technology
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Journal of Photopolymer Science and Technology 26 (4), 479-483, 2013
フォトポリマー学会
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詳細情報 詳細情報について
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- CRID
- 1390282679302278272
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- NII論文ID
- 130004833521
- 40019685438
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- NII書誌ID
- AA11576862
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- COI
- 1:CAS:528:DC%2BC3sXhtFCmtLrM
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- ISSN
- 13496336
- 09149244
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- NDL書誌ID
- 024660169
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可