Characterization of Resist Molds and Replicated Nickel Dies for Fabricating Micro-Lens Arrays

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Abstract

A new method for fabricating metal dies for the use of micro-lens array molding or stamping was proposed and investigated. As a metal, nickel was used, and the nickel dies were fabricated by replicating the primary resist molds that were directly printed using projection lithography on silicon wafers coated with approximately 10-μm thick positive resist PMER P-LA900PM. Lens array patterns with quasi-spherical cross sections were printed by selecting a wavelength of 405-nm, defocuses between +100 and +200 μm and exposure times of 20-30 min. After printing resist mold patterns of a lens array, a thin gold film was spattered on it, and nickel was electroplated next. The aimed nickel dies were obtained by removing the resist molds from the electroplated nickel blocks. The diameters of nickel dies were faithfully corresponded to those of the resist molds. In addition, the surfaces of nickel dies were very smooth, and the peak-to-valley roughness was almost less than a quarter of visible light wavelengths. The new method will be promisingly effective for fabricating micro-lens arrays.

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