Alkaline-developable and Positive-type Photosensitive Polyimide based on Fluorinated Poly(amic acid) from Diamine with High Hydrophobicity and Fluorinated Diazonaphtoquinone

DOI 機関リポジトリ Web Site Web Site 被引用文献1件 参考文献8件
  • Inoue Yusuke
    Department of Organic and Polymeric Materials, Graduate School of Science and Engineering, Tokyo Institute of Technology
  • Ishida Yoshihito
    Department of Chemistry, Kanagawa University
  • Higashihara Tomoya
    Department of Polymer Science and Engineering, Yamagata University
  • Kameyama Atsushi
    Department of Chemistry, Kanagawa University
  • Ando Shinji
    Department of Organic and Polymeric Materials, Graduate School of Science and Engineering, Tokyo Institute of Technology
  • Ueda Mitsuru
    Department of Chemistry, Kanagawa University

この論文をさがす

抄録

An alkaline-developable positive-type photosensitive polyimide (PSPI) based on fluorinated poly(amic acid) (FPAA) and fluorinated diazonaphtoquinone (FDNQ) as a photoactive compound has been successfully developed as a promising material for use in microelectronics. The FPAA was prepared from 4,4’-(hexafluoroisopropylidene)diphtahlic anhydride and aromatic diamines, 4,4’-oxydianiline (80 mol%), and 4,4’-oxybis(4-phenoxyaniline) (20 mol%). The PSPI consisting of FPAA, catechol (3 wt% to FPAA), and FDNQ (25 wt % to FPAA) showed a high sensitivity of 45 mJ/cm2 and a high contrast of 10 when it was exposed to a 365 nm line (i-line), and developed with 2.38 wt % TMAHaq for 10 seconds at room temperature. A clear positive image of a 6-μm line and space pattern was printed on a film, which was exposed to 80 mJ/cm2 of i-line by a contact printing mode. Thus, this system will be a good candidate for next generation PSPIs.

収録刊行物

被引用文献 (1)*注記

もっと見る

参考文献 (8)*注記

もっと見る

キーワード

詳細情報 詳細情報について

問題の指摘

ページトップへ