Spatial Point Analysis of Ion Track Patterns using Common Polymer Films by Atomic Forced Microscopy
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- Omichi Masaaki
- Department of Applied Chemistry, Graduate School of Engineering, Osaka University Center for Collaborative Research, Anan National College of Technology
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- Choi Wookjin
- Department of Applied Chemistry, Graduate School of Engineering, Osaka University
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- Tsukuda Satoshi
- Institute of Multidisciplinary Research for Advanced Materials, Tohoku University
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- Sugimoto Masaki
- Japan Atomic Energy Agency, Takasaki Advanced Radiation Research Institute
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- Seki Shu
- Department of Applied Chemistry, Graduate School of Engineering, Osaka University
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In the all fluence, the observed cumulative probabilities agree mostly with the theoretical cumulative probability. Random patterns, again, are reproducible to the distribution of ion tracks, and the charged ion particle rarely interferes with another charged ion particles at low fluence. This is the first report that nearest neighbor method was also applied to track pattern. This analysis will be contributed to not only fundamental study but also applied study such as cancer therapy.
収録刊行物
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- Journal of Photopolymer Science and Technology
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Journal of Photopolymer Science and Technology 27 (5), 561-564, 2014
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詳細情報 詳細情報について
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- CRID
- 1390282679302427520
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- NII論文ID
- 130004691084
- 40020132877
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- NII書誌ID
- AA11576862
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- ISSN
- 13496336
- 09149244
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- NDL書誌ID
- 025603948
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
- KAKEN
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- 使用不可