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- HAN JIEP ING
- Microlectronics R & D Center, Academia Sinica
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- HOU HAOQING
- Microlectronics R & D Center, Academia Sinica
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- YAN XIHGTIAH
- Microlectronics R & D Center, Academia Sinica
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- XU WEIDONG
- Microlectronics R & D Center, Academia Sinica
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- CHEN MONGZHEH
- Microlectronics R & D Center, Academia Sinica
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説明
The role of organic small molecule compounds in coating-catalytic dry etching has been studied. Different compounds gives different properties on adsorbing HF gas. A unique series of coating-catalysts have, based on these properties, been investigated for the etching reaction of HF gas on SiO2 surface, and a novel technique in microlithography has been invented
収録刊行物
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- Journal of Photopolymer Science and Technology
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Journal of Photopolymer Science and Technology 5 (3), 515-524, 1992
フォトポリマー学会
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詳細情報 詳細情報について
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- CRID
- 1390282679302668160
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- NII論文ID
- 130003488699
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- COI
- 1:CAS:528:DyaK3sXhsl2rtr8%3D
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- ISSN
- 13496336
- 09149244
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可