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- Sooriyakumaran Ratnam
- IBM Almaden Research Center
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- Hoa Truong
- IBM Almaden Research Center
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- Sundberg Linda
- IBM Almaden Research Center
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- Morris Mark
- IBM Almaden Research Center
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- Hinsberg Bill
- IBM Almaden Research Center
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- Ito Hiroshi
- IBM Almaden Research Center
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- Allen Robert
- IBM Almaden Research Center
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- Huang Wu-Song
- IBM Microelectronics
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- Goldfarb Dario
- IBM Microelectronics
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- Burns Sean
- IBM T. J. Watson Research Center
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- Pfeiffer Dirk
- IBM T. J. Watson Research Center
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Derivatives of Polyhedral Oligomeric Silsesquioxanes (POSS) and Oligosaccharides have been investigated as potential candidates for high resolution resists. POSS materials are cage compounds with defined mono-disperse molecular weights. Oligosaccharides are carbohydrates with defined number of monosaccharide units (2 to10) and may be cyclic or linear. These materials are attractive candidates for molecular resist development because of their commercial availability and the ease with which they can be derivatized. We have developed high resolution positive resists suitable for 193-nm and other emerging lithographic applications based on these materials.
収録刊行物
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- Journal of Photopolymer Science and Technology
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Journal of Photopolymer Science and Technology 18 (3), 425-429, 2005
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詳細情報 詳細情報について
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- CRID
- 1390282679302847744
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- NII論文ID
- 130004833047
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- NII書誌ID
- AA11576862
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- COI
- 1:CAS:528:DC%2BD2MXmtVCmsbs%3D
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- ISSN
- 13496336
- 09149244
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- NDL書誌ID
- 7338350
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可