アモルファス薄膜ニッケル‐ホウ素合金の調製とその表面状態および反応性

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  • Surface characterization and catalytic properties of amorphous nickel-boron films prepared by the sputtering method.
  • アモルファス ハクマク ニッケル ホウソ ゴウキン ノ チョウセイ ト ソノ

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Amorphous Ni-B films were prepared by an RF glow discharge sputtering system that was discharged between the inside and outside electrodes of a reactor cell. It was used a high purity of Ar and B21-16d iluted with FI, as a sputtering atmosphere. The surface composition and the surface state of the films were examined by X-ray photoelectron spectroscopy (XPS). The amorphous state of the films was confirmed by X-ray diffraction measurement. It was found that the Ni-B films with various compositions were easily obtained and that the Ni-B films containing boron above 15 atom% became an amorphous state.<BR>n Ni 2p 3/2 spectra of XPS a satellite peak appeared on the higher binding energy side of the main peak. With increasing the concentration of boron, the intensity of the satellite peakdecreased and the separation between the main and satellite peaks increased and the main peak became less asymmetric. This indicates that unoccupied d-holes of Ni are partly filled by the electrons transferred from B to Ni increasing electron density of nickel.<BR>The hydrogenation of 1, 3-butadiene was carried out in a conventional clo sed circulation system over the amorphous Ni-B films. The product distributions was changed with the B concentration of the Ni-B films. This change could be associated with the electron density of nickel, that is, the hydrogenation ability of nickel increased with increasing the electron density of nickel.

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