Characterization of LaNi<SUB>5</SUB>, Thin Films Prepared by Sputtering and Evaporating Methods

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Other Title
  • スパッター法および蒸着法により作製されたLaNi<SUB>5</SUB>薄膜の性質
  • スパッター法および蒸着法により作製されたLaNi5薄膜の性質
  • スパッタ -ホウ オヨビ ジョウチャクホウ ニ ヨリ サクセイサレタ LaNi
  • Thin films-preparation, structure and properties. Characterization of LaNi5 thin films prepared by sputtering and evaporating methods.

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Abstract

Amorphous LaNi5, films were ptepared by a sputtering method. Hydrogenation characteristics of the films were investigated and the results were compared with those of the evaporated films.<BR>The density of the sputtered LaNi5 film was about 6 g/cm3, which was larger than that of the evaporated film. Thermal conductivities of the films were larger than those of a bulk sample,

Journal

  • NIPPON KAGAKU KAISHI

    NIPPON KAGAKU KAISHI 1987 (11), 1875-1879, 1987-11-10

    The Chemical Society of Japan

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