- 【Updated on May 12, 2025】 Integration of CiNii Dissertations and CiNii Books into CiNii Research
- Trial version of CiNii Research Knowledge Graph Search feature is available on CiNii Labs
- 【Updated on June 30, 2025】Suspension and deletion of data provided by Nikkei BP
- Regarding the recording of “Research Data” and “Evidence Data”
Three Phase Contact Line Behavior and Remaining Liquid Film⁄Droplet Formation in Marangoni Drying
-
- MIYAMOTO Yasuharu
- 芝浦工業大学大学院 工学研究科 地域環境システム専攻
-
- KAMOSHIDA Junji
- 芝浦工業大学 工学部 機械工学第二学科
-
- YAMADA Jun
- 芝浦工業大学 工学部 機械工学科
Bibliographic Information
- Other Title
-
- マランゴニ乾燥における三相界線挙動と残留液膜·液滴生成
- マランゴニ乾燥における三相界線挙動と残留液膜・液滴生成
- マランゴニ カンソウ ニ オケル サンソウ カイセン キョドウ ト ザンリュウ エキマク エキテキ セイセイ
Search this article
Description
To clarify the mechanism of Marangoni drying used for rinsing and drying process in semiconductor manufacturing industries, the concentration of organic component in the meniscus during organic vapor dissolution have been measured with a micro-optical concentration sensor and have been visualized by phenol red reagent when ammonia gas was used as organic gas. It is clarified that a concentration gradient that induces Marangoni force appears in the meniscus during the vapor dissolution and the three phases line is pulled down by the Marangoni force. In addition, behavior of three phases line has been observed, while the wafer is drawn up, by using a CCD camera. This reveals that the liquid film separates from the meniscus and remains on the wafer when a wave hits on the wafer.
Journal
-
- Thermal Science and Engineering
-
Thermal Science and Engineering 16 (4), 113-120, 2008
The Heat Transfer Society of Japan
- Tweet
Details 詳細情報について
-
- CRID
- 1390282679392629888
-
- NII Article ID
- 130000101287
-
- NII Book ID
- AA11358679
-
- ISSN
- 18822592
- 09189963
-
- NDL BIB ID
- 9693242
-
- Text Lang
- ja
-
- Data Source
-
- JaLC
- NDL Search
- CiNii Articles
-
- Abstract License Flag
- Disallowed