Three Phase Contact Line Behavior and Remaining Liquid Film⁄Droplet Formation in Marangoni Drying

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  • マランゴニ乾燥における三相界線挙動と残留液膜·液滴生成
  • マランゴニ乾燥における三相界線挙動と残留液膜・液滴生成
  • マランゴニ カンソウ ニ オケル サンソウ カイセン キョドウ ト ザンリュウ エキマク エキテキ セイセイ

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To clarify the mechanism of Marangoni drying used for rinsing and drying process in semiconductor manufacturing industries, the concentration of organic component in the meniscus during organic vapor dissolution have been measured with a micro-optical concentration sensor and have been visualized by phenol red reagent when ammonia gas was used as organic gas. It is clarified that a concentration gradient that induces Marangoni force appears in the meniscus during the vapor dissolution and the three phases line is pulled down by the Marangoni force. In addition, behavior of three phases line has been observed, while the wafer is drawn up, by using a CCD camera. This reveals that the liquid film separates from the meniscus and remains on the wafer when a wave hits on the wafer.

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