Sputter Deposition of YSZ Epitaxial Buffer Layer at Wafer Level for Piezoelectric MEMS Utilizing PZT-based Monocrystalline Thin Film
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- Nishizawa Shinsuke
- Shuji Tanaka Lab., Department of Bioengineering and Robotics, Tohoku University
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- Yoshida Shinya
- Shuji Tanaka Lab., Department of Bioengineering and Robotics, Tohoku University
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- Wasa Kiyotaka
- Yokohama City University
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- Tanaka Shuji
- Shuji Tanaka Lab., Department of Bioengineering and Robotics, Tohoku University
Bibliographic Information
- Other Title
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- PZT系単結晶薄膜を用いた圧電MEMSのためのYSZエピタキシャルバッファ層のウエハレベルスパッタ成膜
- PZTケイタンケッショウ ハクマク オ モチイタ アツデン MEMS ノ タメ ノ YSZ エピタキシャルバッファソウ ノ ウエハレベルスパッタセイマク
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Abstract
<p>Yttria-stabilized zirconia (YSZ) for the initial buffer layer of lead zirconate titanate (PZT) was epitaxially deposited on a 4 inch Si wafer by radio-frequency magnetron sputtering, which was potentially applicable to mass-production. To avoid excessive oxidation of a Si surface, a seeding later was formed on Si by repeating the sputter-deposition and thermal oxidation of metallic Zr and Y. On the seed layer, YSZ was deposited up to 100 nm in thickness by reactive sputtering at 800℃. Cube-on-cube epitaxial growth and excellent crystallinity were confirmed by X-ray diffraction (XRD). On the buffer layer including YSZ at the bottom (YSZ/CeO2/LSCO/SRO), monocrystalline doped-PZT (PMnN-PZT) was grown by sputter-deposition, demonstrating the usefulness of the developed YSZ buffer layer deposition technology.</p>
Journal
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- IEEJ Transactions on Sensors and Micromachines
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IEEJ Transactions on Sensors and Micromachines 136 (10), 437-442, 2016
The Institute of Electrical Engineers of Japan
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Details 詳細情報について
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- CRID
- 1390282679437184640
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- NII Article ID
- 130005598212
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- NII Book ID
- AN1052634X
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- ISSN
- 13475525
- 13418939
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- NDL BIB ID
- 027712095
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- Text Lang
- ja
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed