High-Throughput Characterization of Thin Film Shape Memory Alloys
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- Aono Yuko
- Tokyo Institute of Technology
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- Kawaguchi Ryutaro
- Tokyo Institute of Technology
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- Sakurai Junpei
- Tokyo Electron Ltd.
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- Hata Seiichi
- Nagoya University
Bibliographic Information
- Other Title
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- 薄膜形状記憶合金のハイスループット評価法
- ハクマク ケイジョウ キオク ゴウキン ノ ハイスループット ヒョウカホウ
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Abstract
Thin film shape memory alloys (SMAs) are promising materials for micro-machines because of their high-output power, large strain, and actuation without high voltage. To search for compositions of suitable thin film SMAs for each application, combinatorial technique is useful tool, however the technique requires high-throughput characterization method for thermal property which is an important property of thin film SMAs such as two way martensitic transformation temperature and thermal hysteresis. In this paper, novel high-throughput characterization method for such properties using thermography is proposed and demonstrated. Compositionally integrated thin film SMA samples (TiNiPd) with only 1mm2 of each area are characterized at once. The difference of martensitic and reverse martensitic transformation temperature against those temperatures measured by a conventional method, differential scanning calorimetry, is about 5K.
Journal
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- IEEJ Transactions on Sensors and Micromachines
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IEEJ Transactions on Sensors and Micromachines 133 (8), 348-353, 2013
The Institute of Electrical Engineers of Japan
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Details 詳細情報について
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- CRID
- 1390282679437527936
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- NII Article ID
- 10031189072
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- NII Book ID
- AN1052634X
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- ISSN
- 13475525
- 13418939
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- NDL BIB ID
- 024846520
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- Text Lang
- ja
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed