書誌事項
- タイトル別名
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- Development of the Local Ambient Gas Control Technology and its Application to Atmospheric Pressure Plasma Processes
- カイホウケイ デ ノ プラズマプロセス ジツゲン ニ ムケタ フンイキ セイギョ ギジュツ カイハツ
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抄録
Local ambient gas control technologies for atmospheric pressure plasma processes using a new curtain gas structure have been developed. The local ambient gas control was studied theoretically and experimentally. Safe and clean process conditions (reactive gas leakage below 0.1 vol.% and air contamination below 10ppm) were achieved in open air. H2 plasma was generated with H2 concentrations above the explosive limit (4.1% in air) successfully. As an application, Cu reduction and SiO2 etching were demonstrated. These results indicate that our local ambient gas control technologies have adequate potential for atmospheric pressure plasma processes.
収録刊行物
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- 電気学会論文誌Ｅ（センサ・マイクロマシン部門誌）
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電気学会論文誌Ｅ（センサ・マイクロマシン部門誌） 133 (5), 164-169, 2013
一般社団法人 電気学会
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詳細情報 詳細情報について
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- CRID
- 1390282679437583232
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- NII論文ID
- 10031167013
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- NII書誌ID
- AN1052634X
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- ISSN
- 13475525
- 13418939
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- NDL書誌ID
- 024671218
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDL
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- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可