Fabrication of Diffractive Optical Elements on a Si Chip by Imprint Lithography using Novel Mold
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- Hirai Yoshihiko
- Osaka Prefecture University
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- Okano Masato
- Osaka Science and Technology Center
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- Okuno Hiroyuki
- Osaka Prefecture University
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- Toyota Hiroshi
- Osaka Science and Technology Center
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- Kikuta Hisao
- Osaka Prefecture University
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- Tanaka Yoshio
- Osaka Prefecture University
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Fabrication of a fine diffractive optical element on a Si chip is demonstrated using imprint lithography. A chirped diffraction grating, which has modulated pitched pattern with curved cross section is fabricated by an electron beam lithography, where the exposure dose profile is automatically optimized by computer aided system. Using the resist pattern as an etching mask, anisotropic dry etching is performed to transfer the resist pattern profile to the Si chip. The etched Si substrate is used as a mold in the imprint lithography. The Si mold is pressed to a thin polymer (Poly methyl methacrylate) on a Si chip. After releasing the mold, a fine diffractive optical pattern is successfully transferred to the thin polymer. This method is exceedingly useful for fabrication of integrated diffractive optical elements with electric circuits on a Si chip.
収録刊行物
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- 電気学会論文誌E(センサ・マイクロマシン部門誌)
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電気学会論文誌E(センサ・マイクロマシン部門誌) 122 (8), 398-403, 2002
一般社団法人 電気学会
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詳細情報 詳細情報について
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- CRID
- 1390282679438634240
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- NII論文ID
- 130005403986
- 10009583371
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- NII書誌ID
- AN1052634X
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- ISSN
- 13475525
- 13418939
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- NDL書誌ID
- 6244558
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
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- 使用不可