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Improvement of Sensitivity of MEMS Ultrasonic Sensor Using P(VDF/TrFE) Thin Films
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- Tanaka Tsunehisa
- Technology Research Institute of Osaka Prefecture
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- Murakami Shuichi
- Technology Research Institute of Osaka Prefecture
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- Uno Mayumi
- Technology Research Institute of Osaka Prefecture
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- Yamashita Kaoru
- Graduate School of Science and Technology, Kyoto Institute of Technology
Bibliographic Information
- Other Title
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- P(VDF/TrFE)薄膜を用いたMEMS超音波センサの感度改善
- P(VDF/TrFE)ハクマク オ モチイタ MEMS チョウオンパ センサ ノ カンド カイゼン
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Description
MEMS (microelectromechanical systems) ultrasonic sensors were fabricated using a polyvinylidene fluoride-trifluoroethylene (P(VDF/TrFE)) copolymer thin film on multilayered diaphragm structures. We developed a new diaphragm structure to improve the sensitivity through lowering the stiffness of the vibration part of the sensor compared to the conventional ones. The new sensor structure improved the sensitivity up to about 5 times compared to conventional the ones. Fabricated sensors with the new structure showed their sensitivity, resonant frequency and Q-value as -74 dB (1V/Pa = 0 dB), 89.2 kHz and 24, respectively.
Journal
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- IEEJ Transactions on Sensors and Micromachines
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IEEJ Transactions on Sensors and Micromachines 136 (5), 134-141, 2016
The Institute of Electrical Engineers of Japan
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Keywords
Details 詳細情報について
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- CRID
- 1390282679439292928
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- NII Article ID
- 130005149052
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- NII Book ID
- AN1052634X
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- ISSN
- 13475525
- 13418939
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- NDL BIB ID
- 027423666
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- Text Lang
- ja
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- Data Source
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- JaLC
- NDL Search
- Crossref
- CiNii Articles
- OpenAIRE
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- Abstract License Flag
- Disallowed