Study of the field evaporation mechanism of laser-assisted atom probe

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  • Terakawa Tetsuo
    Institute of industrial Science,The University of Tokyo
  • Mayama Norihito
    Institute of industrial Science,The University of Tokyo
  • Kajiwara Yasuko
    Institute of industrial Science,The University of Tokyo Environmental Science Center, The University of Tokyo
  • Owari Masanori
    Institute of industrial Science,The University of Tokyo Environmental Science Center, The University of Tokyo

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The three-dimensional atom probe (3DAP) has been used to analyze atomic-scale characterization of a number of nanostructured materials. However, it faces a problem of uncertain field evaporation mechanism by using laser at this time. Resolving this problem is very important to carry out the quantitative analysis in 3DAP. In this paper, we focused on the different reflectivity of tungsten (50 %), nickel (70 %) and aluminum (85-90 %), and measured them with changed laser power in the 3DAP. From the results, it was indicated that the shift of detection ions with the increase of laser power was different by the reflectivity of material. Also, we compared the field evaporation behavior at the laser pulse with that at the voltage pulse. According to these results, we verified the effect that affected the field evaporation mechanism due to the difference of reflectivity.

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