原子ビームを用いた細胞接着パターンの作成

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書誌事項

タイトル別名
  • Cell Micro-Patterning by Atom Beam Exposure
  • ゲンシ ビーム オ モチイタ サイボウ セッチャク パターン ノ サクセイ

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説明

This study aimed to develop a new cell micro-patterning method by controlling material surface affinity of the cell using atomic oxygen beam exposure. Surfaces of low-density polyethylene (LDPE) and tetrafluoroethylene-hexafluoropropylene (FEP) were exposed to the atomic oxygen beam. On the LDPE surface, the roughness measured by atomic force microscopy (AFM) did not change much, however, the oxygen concentration on the surface measured by X-ray photoelectron spectroscopy (XPS) significantly increased that resulted in increase in wettability. Contrary to this, on the FEP surface, the oxygen concentration showed no significant change, but roughness of the surface remarkably increased and the wettability decreased. As a result of the surface modification, affinity of the osteoblastic cells on the FEP surface increased, which was also confirmed by increase in the cell area. Finally, cell micro-patterning on the FEP surface was carried out based on difference in the affinity between modified and unmodified surfaces patterned by a masking method.

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