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- 小島 紀徳
- 成蹊大学工学部 工業化学科
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- 若月 亮太
- 成蹊大学工学部 工業化学科
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- 松方 正彦
- 成蹊大学工学部 工業化学科
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- 小沢 英一
- (株) エール・リキード・ラボラトリーズ
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- Friedt Jean M.
- Air Liquide Laboratories
書誌事項
- タイトル別名
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- Coating of Fine Particles with Ultrafine Silicon Powder by Gas-Phase Monosilane Pyrolysis.
- モノシラン ノ キソウ ネツ ブンカイ ニ ヨル ビリュウシ エ ノ シリコン
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Silicon nitride particles with a diameter of 520 μm were coated with ultrafine, submicron silicon powder. The product is expected to show extreme properties in a reactive sintering process.<BR>A uniform and dilute suspension of core particles of silicon nitride in monosilane diluted with argon were introduced into a CVD reactor from a bed of core particles. Additional argon gas was also introduced into the reactor, from the annulus at the bottom of the reactor. The flow resistance of the procuct layer was found to be proportional to the amount of silicon fines. From the results of SEM and TEM, it was found that the core particles were uniformly coated with ultrafine silicon powder with primary particle diameter of around 0.01 μm. In the XRD chart, a weak pattern of silicon fines was found to overlap the pattern of silicon nitride. Without the use of additional gas, on the other hand, core particles coated with a thick deposit were manufactured and a broad XRD chart without the silicon pattern was observed. Heterogeneous deposition of silicon on core particles was found to be avoided by the use of additional gas. The additional gas seemed to be heated in the bottom of the reactor and to mix with reactant gas, thereby causing the homogeneous reaction and suppressing heterogenous CVD by reducing the residence time in the reactor.
収録刊行物
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- 化学工学論文集
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化学工学論文集 18 (3), 274-280, 1992
公益社団法人 化学工学会
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詳細情報 詳細情報について
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- CRID
- 1390282679485366016
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- NII論文ID
- 130000863212
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- NII書誌ID
- AN00037234
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- ISSN
- 13499203
- 0386216X
- http://id.crossref.org/issn/0386216X
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- NDL書誌ID
- 3784089
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可