Magnetoresistive effects in magnetic tunneling junctions with various insulating materials
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- NAKATANI Ryoichi
- Central Research Laboratory, Hitachi, Ltd.
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- SHIMIZU Noboru
- Central Research Laboratory, Hitachi, Ltd.
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- TAKEUCHI Teruaki
- Central Research Laboratory, Hitachi, Ltd.:(Present address)Tukuba Research Laboratory, Hitachi Maxell, Ltd.
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- ITABASHI Hiromitsu
- Electronic Devices Works, Hitachi Metals, Ltd.
Bibliographic Information
- Other Title
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- 磁気トンネリング素子の絶縁層材料と磁気抵抗効果
- ジキ トンネリング ソシ ノ ゼツエンソウ ザイリョウ ト ジキ テイコウ コウカ
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Abstract
We investigated relationship between magnetoresistive effects and barrier heights in "Ni-20at%Fe(15 nm)/insulator(1.5-2.0 nm)/Co-17at%Pt(30 nm)/substrate" magnetic tunneling junctions (MTJ) with various insulating materials. The highest magnetoresistance ratio is obtained in the MTJ with Al-O layer. The magnetoresistance ratio in the MTJ with Mg-Al-O layer is 2-3%. The other MTJ show the magnetoresistance ratios less than 1%. The barrier heights of the MTJ with the Al-O and the Mg-Al-O layers are 2.05 eV and 1.04 eV, respectively. The barrier heights of the other MTJ are 0.55-0.71 eV. It is understood that the magnetoresistance ratio becomes high as the barrier height becomes high.
Journal
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- ITE Technical Report
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ITE Technical Report 23.37 (0), 15-18, 1999
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Details 詳細情報について
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- CRID
- 1390282679500156928
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- NII Article ID
- 110003686868
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- NII Book ID
- AN1059086X
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- ISSN
- 24241970
- 13426893
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- NDL BIB ID
- 4784102
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- Text Lang
- ja
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- Data Source
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- JaLC
- NDL
- CiNii Articles
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- Abstract License Flag
- Disallowed