Preparation of Co-Cr-Ta/Ti perpendicular magnetic recording disk using ECR-sputter-deposition : Effect of microwave power

DOI Web Site 7 References

Bibliographic Information

Other Title
  • ECRスパッタ法によるCo-Cr-Ta/Ti垂直磁気ディスクの作製 : マイクロ波電力による物性制御
  • ECR スパッタホウ ニ ヨル Co Cr Ta Ti スイチョク ジキ ディスク ノ サクセイ マイクロハ デンリョク ニ ヨル ブッセイ セイギョ

Search this article

Abstract

In sputtering apparatus using electron-cyclotron-resonance microwave plasma, microwave power was focused to achieve high quahty Co-Cr-Ta/Ti perpendicular magnetic recording disk. Plasma density, deposition rate and quantity of Ar ion irradiation during film deposition were increased with increasing microwave power. A perpendicular magnetic disk with fine grains exhibiting superior magnetic and recording performance was fabricated at high average deposition rate by controlling microwave power, that is, microwave was changed from high power to low power during Co-Cr-Ta film deposition.

Journal

  • ITE Technical Report

    ITE Technical Report 24.4 (0), 1-8, 2000

    The Institute of Image Information and Television Engineers

References(7)*help

See more

Keywords

Details 詳細情報について

Report a problem

Back to top