Analysis of secondary electron emission yield of MgO thin films
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- Ishimoto Manabu
- Fujitsu Laboratories LTD.
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- Hidaka Souichiro
- Fujitsu Laboratories LTD.
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- Betsui Keiichi
- Fujitsu Laboratories LTD.
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- Shinoda Tutae
- Fujitsu Laboratories LTD.
Bibliographic Information
- Other Title
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- MgOの2次電子放出係数測定
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Abstract
We successfully measured the secondary electron emission yield (γ) of MgO thin films for protecting layer of AC-PDP. We made the measurement apparatus with which we could measure the γ in high stability. The variation of repeating measurement and the long-time (1 hour) measurement were within 5%. With this apparatus, we measured the heat treatment effect on γ, and the relationship between γ and the acceleration voltage of induced ion. And we also measured the energy distribution of secondary electrons from metal (copper) and MgO to investigate the electron emission process. We investigated the difference of the distribution between the metal and non-conductive material, and we discuss the surface charge effect on the distribution.
Journal
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- ITE Technical Report
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ITE Technical Report 23.1 (0), 159-163, 1999
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Keywords
Details 詳細情報について
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- CRID
- 1390282679501418112
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- NII Article ID
- 110003686519
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- NII Book ID
- AN1059086X
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- ISSN
- 24241970
- 13426893
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- Text Lang
- ja
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- Data Source
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- JaLC
- CiNii Articles
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- Abstract License Flag
- Disallowed