クワ葉柄の上偏生長におよぼすエスレルの影響

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  • Effects of ethrel treatment on epinasty of mulberry petioles.
  • クワ ヨウヘイ ノ ジョウ ヘンセイチ

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Epinasty of mulberry (Morus alba L. cv. Shin-ichinose) petioles was studied using on aqueous ethrel (2-chloroethylphosphonic acid) solution. The minimum amount of ethrel required to cause epinasty ranged between 1ppm when applied to the leaf blade, to 10ppm when applied to the petiole. Curvature of the petioles was maximum 2 days after the application of ethrel, then the petioles recovered to some extent when the leaf blade was treated with 1-10ppm ethrel or when the petiole was treated with 10-100ppm ethrel. The application of 500ppm ethrel to the upper side of the petiole caused a much greater curvature than the application to the under side. Amongst the lower, middle and upper portions of the petiole, the lower (basal) portion was most sensitive to the 500ppm ethrel treatment. The response of the petioles to ethrel depended on their developmental stages, i. e., the curvature was in the following order: middle leaf>upper leaf>lower leaf.

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