書誌事項
- タイトル別名
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- Surface Evaluation of LiNbO3, LiTaO3 Crystals Etched Using Fluorine System Gas Plasma RIE
- フッソケイ ガスプラズマ RIE オ モチイタ LiNbO3 LiTaO3 ケッショウ ノ カコウ ヒョウメン ヒョウカ
この論文をさがす
説明
Etching characteristic LiNbO3 and LiTaO3 single crystals has been investigated using plasma RIE with mixture gases of CF4/Ar, CF4/H2, CF4/Ar/H2. The etched surface was evaluated by means of atomic force microscopy and X-ray diffraction methods. The in situ surface temperature of the sample during RIE was measuresd. F atoms exist in the contamination layer, such as sediments, on the surface etched using the mixture gases of CF4, Ar and H2 gases. The etch rate was dependent on the orientation of a crystal. The etch rate of LiTaO3 was less than that of LiNbO3.
収録刊行物
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- 電気学会論文誌． Ａ
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電気学会論文誌． Ａ 123 (8), 731-737, 2003
一般社団法人 電気学会
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詳細情報 詳細情報について
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- CRID
- 1390282679569974784
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- NII論文ID
- 10011449852
- 30011540761
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- NII書誌ID
- AN10136312
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- ISSN
- 13475533
- 03854205
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- NDL書誌ID
- 6659363
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDLサーチ
- Crossref
- CiNii Articles
- OpenAIRE
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- 抄録ライセンスフラグ
- 使用不可
