書誌事項
- タイトル別名
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- Evaluation of Nanopulse Plasma and its Application to DLC Film Deposition
- ナノパルスプラズマ ノ ジョウタイ ヒョウカ オヨビ DLC マク ゴウセイ エ ノ オウヨウ
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抄録
The nanopulse CVD method open the way of DLC deposition at sub-atmospheric pressure. On the other hand, plasma characteristics of nanopulse plasma have not investigated yet. In this paper, we have investigated the plasma characteristics of nanopulse plasma using the Langmuir probe method at low pressure. Using of the characteristics of high electron density created by positive pulse, we have developed the bipolar nanopulse generator consisted with Static Induction Thyristor devices. The deposition rate of this bipolar nanopulse plasma CVD method is five fold higher than that of normal unipolar pulse CVD method. The productivity of plasma assisted coating will be significantly improved by this bipolar nanopulse CVD method.
収録刊行物
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- 電気学会論文誌. A
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電気学会論文誌. A 126 (3), 157-162, 2006
一般社団法人 電気学会
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詳細情報 詳細情報について
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- CRID
- 1390282679571474560
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- NII論文ID
- 10017277171
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- NII書誌ID
- AN10136312
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- ISSN
- 13475533
- 03854205
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- NDL書誌ID
- 7855714
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDL
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- CiNii Articles
- KAKEN
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- 抄録ライセンスフラグ
- 使用不可