Evaluation of Nanopulse Plasma and its Application to DLC Film Deposition
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- Saito Takao
- NGK INSULATORS, LTD.
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- Kondo Yoshimasa
- NGK INSULATORS, LTD. Tokyo Institute of Technology
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- Terazawa Tatuya
- NGK INSULATORS, LTD.
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- Saito Masanori
- Tokyo Institute of Technology
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- Ohtake Naoto
- Tokyo Institute of Technology
Bibliographic Information
- Other Title
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- ナノパルスプラズマの状態評価及びDLC膜合成への応用
- ナノパルスプラズマ ノ ジョウタイ ヒョウカ オヨビ DLC マク ゴウセイ エ ノ オウヨウ
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Abstract
The nanopulse CVD method open the way of DLC deposition at sub-atmospheric pressure. On the other hand, plasma characteristics of nanopulse plasma have not investigated yet. In this paper, we have investigated the plasma characteristics of nanopulse plasma using the Langmuir probe method at low pressure. Using of the characteristics of high electron density created by positive pulse, we have developed the bipolar nanopulse generator consisted with Static Induction Thyristor devices. The deposition rate of this bipolar nanopulse plasma CVD method is five fold higher than that of normal unipolar pulse CVD method. The productivity of plasma assisted coating will be significantly improved by this bipolar nanopulse CVD method.
Journal
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- IEEJ Transactions on Fundamentals and Materials
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IEEJ Transactions on Fundamentals and Materials 126 (3), 157-162, 2006
The Institute of Electrical Engineers of Japan
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Details 詳細情報について
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- CRID
- 1390282679571474560
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- NII Article ID
- 10017277171
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- NII Book ID
- AN10136312
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- ISSN
- 13475533
- 03854205
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- NDL BIB ID
- 7855714
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- Text Lang
- ja
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
- KAKEN
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- Abstract License Flag
- Disallowed