Formation of the Controlled Plasma and the Application to the Surface Modification of a Carbon Material
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- Ohte Takeo
- Gunma College of Technology
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- Kojima Akira
- Gunma College of Technology
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- Katoh Masaaki
- Gunma College of Technology
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- Ohtani Sugio
- Tokai University
Bibliographic Information
- Other Title
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- 制御されたプラズマの生成と炭素材料表面改質への応用
- セイギョサレタ プラズマ ノ セイセイ ト タンソ ザイリョウ ヒョウメン カ
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Abstract
An investigation was conducted on the formation of controlled plasma and damage-less modification of the surface of a carbon material by this controlled plasma. We developed a method to control the sheath voltage independently of the other plasma parameters. A controlled plasma with high ion density and low sheath voltage was formed by this method. The surface of glassy carbon (GC; bulk density: 1.50g/cm3; intrinsic resistance: 4, 200μ•cm; flexural strength: 1, 700kg•f/cm2) was modified by this plasma. In order to estimate effects of the surface modification, the contact angle of water with the glassy carbon surface and ESCA spectra before and after plasma surface modification were measured. To evaluate the damages to the glassy carbon surface, we observed the surface by SEM and measured Raman spectra.<br>We controlled Ar plasma to have the high ion density of 6×1010cm-3 and the low sheath voltage of 50V. In the case of no control, the sheath voltage is 200V with the same density. The contact angle of water with the GC surface decreases from 60° to 1° (untreated surface: 90°) and the O/C value (ratio of O to C) obtained by ESCA increases from 0.1 to 0.21 (untreated surface: 0.06) as the ion density increases from 1.8×1010cm-3 to 6×1010m-3. The data show that the GC surface is modified more strongly as the ion density increases. However, the half-width of the Raman band at 1, 360cm-1 of the GC surface does not appreciably increase, and little morphology change upon increasing the ion density is observed.<br>These results suggest that damage-less modification can be carried out by using the controlled plasma with high ion density and low sheath voltage.
Journal
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- IEEJ Transactions on Fundamentals and Materials
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IEEJ Transactions on Fundamentals and Materials 114 (12), 861-868, 1994
The Institute of Electrical Engineers of Japan
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Details 詳細情報について
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- CRID
- 1390282679575882624
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- NII Article ID
- 130006838969
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- NII Book ID
- AN10136312
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- ISSN
- 13475533
- 03854205
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- NDL BIB ID
- 3901672
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed