Phenol Decomposition Process by Pulsed-discharge Plasma above a Water Surface in Oxygen and Argon Atmosphere

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  • Shiota Haruki
    Division of Information & Electronic Engineering, Graduate School of Engineering, Muroran Institute of Technology
  • Itabashi Hideyuki
    Division of Information & Electronic Engineering, Graduate School of Engineering, Muroran Institute of Technology
  • Satoh Kohki
    Division of Information & Electronic Engineering, Graduate School of Engineering, Muroran Institute of Technology Center of Environmental Science and Disaster Mitigation for Advanced Research, Muroran Institute of Technology
  • Itoh Hidenori
    Division of Information & Electronic Engineering, Graduate School of Engineering, Muroran Institute of Technology

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Other Title
  • O<sub>2</sub>およびAr雰囲気での水上パルス放電におけるフェノール分解過程
  • O₂およびAr雰囲気での水上パルス放電におけるフェノール分解過程
  • O ₂ オヨビ Ar フンイキ デ ノ スイジョウ パルス ホウデン ニ オケル フェノール ブンカイ カテイ

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Abstract

By-products from phenol by the exposure of pulsed-discharge plasma above a phenol aqueous solution are investigated by gas chromatography mass spectrometry, and the decomposition process of phenol is deduced. When Ar is used as a background gas, catechol, hydroquinone and 4-hydroxy-2-cyclohexene-1-on are produced, and no O3 is detected; therefore, active species such as OH, O, HO2, H2O2, which are produced from H2O in the discharge, can convert phenol into those by-products. When O2 is used as a background gas, formic acid, maleic acid, succinic acid and 4,6-dihydroxy-2,4-hexadienoic acid are produced in addition to catechol and hydroquinone. O3 is produced in the discharge plasma, so that phenol is probably decomposed into 4,6-dihydroxy-2,4-hexadienoic acid by 1,3-dipolar addition reaction with O3, and then 4,6-dihydroxy-2,4-hexadienoic acid can be decomposed into formic acid, maleic acid and succinic acid by 1,3-dipolar addition reaction with O3.

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