書誌事項
- タイトル別名
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- Breakdown Mechanism of Plasma Polymerized Ethylene and Ethylene-trifluoromethane Films
- プラズマ ジュウゴウ エチレン オヨビ フッソ ガンユウ エチレン ハクマク
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Breakdown mechanism was studied for plasma polymer films of ethylene and those of ethylene and trifluoromethane. In order to determine carrier species which causes avalanche, high-field conduction, dielectric breakdown and photoconduction were studied. It was found that all these characteristics depend on the anode metal. When the anode is aluminum, the barrier height for tunneling injection obtained from the Fowler-Nordheim relation is higher than the gold anode. The aluminum anode also has a higher dielectric strength and a longer time-lag-to-breakdown than the gold anode.<br>From these results, together with the effect of the shape of illuminated electrode on photocurrent, it is considered holes are injected through tunneling from the anode by high electric stress applied and that avalanche is caused by these holes.
収録刊行物
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- 電気学会論文誌. A
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電気学会論文誌. A 112 (3), 188-195, 1992
一般社団法人 電気学会
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詳細情報 詳細情報について
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- CRID
- 1390282679576552704
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- NII論文ID
- 130006839517
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- NII書誌ID
- AN10136312
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- ISSN
- 13475533
- 03854205
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- NDL書誌ID
- 3756498
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- データソース種別
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- JaLC
- NDL
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