書誌事項
- タイトル別名
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- Pressure Dependence of Plasma Parameters in Medium-Vacuum N2 Gas Flow Arc Discharge with Titanium Cathode
- チタン インキョク チッソ ドウニュウチュウ シンクウ アーク ホウデン ニ
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説明
N2 gas flow medium-vacuum arc plasma with titanium cathode is applied to the PVD process producing TiN films.<br>In this paper, plasma parameters of such arc are measured for the pressure range from 10-3 to 10-1 Torr using the optical emission spectroscopy and the probe technique. The experimental results show that the arc plasma contains Ti and N2 as neutral particles, and Ti+, Ti++ and N2+ as ions. The spectral intensities of Ti+ and N2 have maximum values at pressures of 2×10-2 and 8×10-3 Torr, respectively. As the pressure increases from 10-3 to 10-1 Torr, the electron energy decreases from 1.3 to 0.2eV and the electron density increases from 1.5×1010 to 1.5×1011cm-3.<br>As a result of analyzing the above characteristics using the corona model, it becomes evident that the pressure at which the number densities of Ti+ ion and N2 molecule are maximum oincides with that at which TiN films are produced in the prevailing arc PVD apparatus.
収録刊行物
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- 電気学会論文誌. A
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電気学会論文誌. A 111 (1), 20-26, 1991
一般社団法人 電気学会
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詳細情報 詳細情報について
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- CRID
- 1390282679576864000
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- NII論文ID
- 130006839780
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- NII書誌ID
- AN10136312
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- ISSN
- 13475533
- 03854205
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- NDL書誌ID
- 3703727
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- データソース種別
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- JaLC
- NDL
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