Pressure Dependence of Plasma Parameters in Medium-Vacuum N2 Gas Flow Arc Discharge with Titanium Cathode

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  • チタン陰極窒素導入中真空アーク放電におけるプラズマパラメータの圧力依存性
  • チタン インキョク チッソ ドウニュウチュウ シンクウ アーク ホウデン ニ

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N2 gas flow medium-vacuum arc plasma with titanium cathode is applied to the PVD process producing TiN films.<br>In this paper, plasma parameters of such arc are measured for the pressure range from 10-3 to 10-1 Torr using the optical emission spectroscopy and the probe technique. The experimental results show that the arc plasma contains Ti and N2 as neutral particles, and Ti+, Ti++ and N2+ as ions. The spectral intensities of Ti+ and N2 have maximum values at pressures of 2×10-2 and 8×10-3 Torr, respectively. As the pressure increases from 10-3 to 10-1 Torr, the electron energy decreases from 1.3 to 0.2eV and the electron density increases from 1.5×1010 to 1.5×1011cm-3.<br>As a result of analyzing the above characteristics using the corona model, it becomes evident that the pressure at which the number densities of Ti+ ion and N2 molecule are maximum oincides with that at which TiN films are produced in the prevailing arc PVD apparatus.

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