Rare-earth Plasma Beyond Extreme Ultraviolet (BEUV) Sources at 6.<i>x</i> nm
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- Otsuka Takamitsu
- Faculty of Engineering, Utsunomiya University School of Physics, University College Dublin
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- Higashiguchi Takeshi
- Faculty of Engineering, Utsunomiya University
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- Yugami Noboru
- Faculty of Engineering, Utsunomiya University
Bibliographic Information
- Other Title
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- 6.<i>x</i> nm領域における希土類プラズマ極端紫外光源
- 6.x nm領域における希土類プラズマ極端紫外光源
- 6.x nm リョウイキ ニ オケル キドルイ プラズマ キョクタン シガイ コウゲン
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Description
We have studied self-absorption effects of a laser-produced plasma (LPP) source at 6.xnm as a function of laser pulse duration and viewing angle. The spectral profiles are shown to have a strong dependence on viewing angle. Absorption effects are less pronounced when a 150-ps pulse duration is used due to reduced opacity resulting from plasma expansion. Conversion efficiencies and ion energies are also measured as a function of laser pulse duration and laser power density. A maximum conversion efficiency of 0.4% within a 0.6% bandwidth was measured, and lower ion kinetic energy was observed. It is concluded that in order to reduce self-absorption effects and ion yields, and increase conversion efficiencies, a short pulse duration should be used.
Journal
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- IEEJ Transactions on Fundamentals and Materials
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IEEJ Transactions on Fundamentals and Materials 133 (10), 526-531, 2013
The Institute of Electrical Engineers of Japan
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Details 詳細情報について
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- CRID
- 1390282679576976896
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- NII Article ID
- 10031200959
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- NII Book ID
- AN10136312
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- ISSN
- 13475533
- 03854205
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- NDL BIB ID
- 024946457
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- Text Lang
- ja
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- Article Type
- journal article
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- Data Source
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- JaLC
- NDL Search
- Crossref
- CiNii Articles
- KAKEN
- OpenAIRE
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- Abstract License Flag
- Disallowed