Characteristics of Extreme Ultraviolet Emission from CO<sub>2</sub> Laser-Produced Plasma
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- Takahashi Akihiko
- Department of Health Sciences, School of Medicine, Kyushu University
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- Tanaka Hiroki
- Industrial Technology Center of Nagasaki
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- Hashimoto Yuuki
- Graduate School of Information Science and Electrical Engineering, Kyushu University
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- Okada Tatsuo
- Graduate School of Information Science and Electrical Engineering, Kyushu University
Bibliographic Information
- Other Title
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- CO<sub>2</sub>レーザ生成プラズマの極端紫外発光特性
- C02レーザ生成プラズマの極端紫外発光特性
- C02 レーザ セイセイ プラズマ ノ キョクタン シガイ ハッコウ トクセイ
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Abstract
In the development of extreme ultraviolet (EUV) lithography source using laser-produced plasma (LPP), it is important to investigate the optimum wavelength of the driver laser to obtain the high conversion efficiency. We have proposed the EUV generation pumped by CO2 laser-produced plasma. In this article, we show the characteristics of EUV emission from gas and solid Xe irradiated by a TEA CO2 laser. The conversion efficiency to 13.5 nm was ∼0.2 %. This value is comparable to those of Nd: YAG LPP with Xe in early works. In order to gain insight into the difference between the CO2 LPP and Nd:YAG LPP, we investigated the emission characteristics from Nd: YAG LPP and CO2 LPP with solid tin under the same experimental setup. As the results, we confirmed that the conversion efficiency of CO2 LPP is comparable to that of Nd: YAG LPP. The conversion efficiency was estimated to be 2 % in maximum.
Journal
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- IEEJ Transactions on Electronics, Information and Systems
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IEEJ Transactions on Electronics, Information and Systems 127 (2), 155-159, 2007
The Institute of Electrical Engineers of Japan
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Details 詳細情報について
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- CRID
- 1390282679583085056
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- NII Article ID
- 10018480421
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- NII Book ID
- AN10065950
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- ISSN
- 13488155
- 03854221
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- NDL BIB ID
- 8668167
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- Text Lang
- ja
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed