Development of a Plasma Spectroscopic Instrument by an Image Processing Method and Verifications

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  • Kumadaki Masahiko
    Muroran Institute of Technology
  • Sato Kohki
    Muroran Institute of Technology Center of Environmental Science and Disaster Mitigation for Advanced Reserch, Muroran Institute of Technology
  • Itoh Hidenori
    Muroran Institute of Technology

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Other Title
  • 画像処理法によるプラズマ発光分光装置の開発と検証
  • ガゾウ ショリホウ ニ ヨル プラズマ ハッコウ ブンコウ ソウチ ノ カイハツ ト ケンショウ

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Plasma measuring methods have been developed to measure the properties of plasmas which cannot be touched directly. For instance, Quadropole Mass Spectroscopy (QMS) was developed to survey what kinds of compound are included in the plasma directly. We have measured by using Plasma Emission Spectroscopy method. It has been considered to be one of the effective method because of not affecting the plasma. We have developed a new type of plasma spectroscopic device by an image processing method. On this paper, we'd like to report advantages and differences between the new device and the old one.

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